商品名:铜屑
别 名:铜;铜粉;电解铜;海绵铜;电解铜粉;电解铜箔;铜(片);铜,粒状Copper powder, -100 mesh, 99.999% (metals basis
英文名:Copper
产 地:湖南
Cas号:7440-50-8
MDL:MFCD00010965
Beilstein:
EINECS:231-159-6
分子结构:
分子式:Cu
分子量:63.5400
备注:以上描述,仅作参考,并不表示您收到的产品,与此项描述完全相符,产品的出厂标准,请参见质量标准。
性状:微红色有光泽具有延展性的金属,露置空气中变暗色,在湿空气中表面变成绿色的碱式碳酸盐,常制成块状、片状、箔状、丝状或粉末等。能很快溶于稀硝酸和热浓硫酸,也溶热浓的氢溴酸,在冷盐酸、稀硫酸或氨水中溶解缓慢。能与乙酸或其他有机酸起作用。
熔点:1083℃
沸点:2595℃
密度:8.92
质量标准:项目 分析纯
(AR)
含量(Cu)Assay,% ≥ 99.5
硝酸不溶物Insoluble matter,% ≤ 0.01
硫化氢沉淀物Snbstances not prec-
ipitated by hydrogen sulfide,% ≤ 0.04
铁(Fe)Iron,% ≤ 0.01
砷(As)Arsenic,% ≤ 0.001
银(Ag)silver,% ≤ 0.002
锑和锡(以Sn计)Antimony and tin,% ≤ 0.01
铅(Pb)Lead,% ≤ 0.01
4N,99.99%
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤100 ppm
纯度Purity(metal basis) ≥99.99 %
99.9%,D50(0.2~0.55μm)
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤1000 ppm
纯度Purity(metal basis) ≥99.9 %
平均粒度Particle size, D50 0.2 - 0.55 μm
99.9%,D50(0.6~1.0μm)
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤1000 ppm
纯度Purity(metal basis) ≥99.9 %
平均粒度Particle size, D50 0.6~1.0μm
99.9%,D50(1.0~3.0μm)
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤1000 ppm
纯度Purity(metal basis) ≥99.9 %
平均粒度Particle size, D50 1.0~3.0μm
99.9%,10-30nm
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤1000 ppm
纯度Purity(metal basis) ≥99.9 %
平均粒度Particle size 10-30nm
99.9%,80-100nm
外观Appearance Copper-colored powder
X射线衍射X-ray diffraction Conforms to standard
纯度Purity (complexometric titration) 98-102 %
ICP Assay Confirms copper component
痕量金属Trace analysis, ICP ≤1000 ppm
纯度Purity(metal basis) ≥99.9 %
平均粒度Particle size 80-100nm
存储:密封保存。
用途:试剂、合金、电镀。
联合编号:
RISK:
Safety:
Hazard: